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Hydrogen in Semiconductors II (Cód: 3026740)

Nickel, Norbert H.

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Hydrogen in Semiconductors II

R$750,00

Descrição

Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The 'quot;Willardson and Beer'quot; Series, as it is widely known, has succeeded in publishing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series'apos; tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded. Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in Semiconductors and Semimetals have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry.Provides the most in-depth coverage of hydrogen in silicon available in a single sourceIncludes an extensive chapter on the neutralization of defects in III*b1V semiconductorsCombines both experimental and theoretical studies to form a comprehensive reference

Características

Peso 0.00 Kg
Produto sob encomenda Sim
Marca ELSEVIER S&T
Número de Páginas 526 (aproximado)
Idioma 337
Acabamento e-book
Territorialidade Internacional
Formato Livro Digital Epub
Gratuito Não
Tamanho do Arquivo 11736
Código do Formato Epub
Cód. Barras 9780080525259
Ano da edição 82009
AutorNickel, Norbert H.