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Handbook of Physical Vapor Deposition (pvd) Processing (Cód: 3053191)

Mattox, Donald M.

William Andrew

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Handbook of Physical Vapor Deposition (pvd) Processing

R$1.071,80

Descrição

This updated version of the popular handbook further explains all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the new edition remains on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications, with additional information to support the original material. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called "

Características

Peso 0.44 Kg
Produto sob encomenda Sim
Marca William Andrew
I.S.B.N. 9780815520375
Altura 0.00 cm
Largura 0.00 cm
Profundidade 0.00 cm
Número de Páginas 792
Idioma Inglês
Acabamento Capa dura
Cód. Barras 9780815520375
Número da edição 2
Ano da edição 5/5/2010
AutorMattox, Donald M.